Si3N4-thermal diffusivity[09-03-00017]
참조표준명 |
Si3N4-thermal diffusivity[09-03-00017] |
참조표준 번호 |
KSRD.03.2009.001.020 |
참조표준 등급 |
유효 참조표준 |
재료규격 |
시료형상 : d:10mm, t:2.5mm 구조 : 밀도 : 3.25~3.29 g/cm2 성분분석 : Si,N 불순물 : 0.99 |
측정방법 |
측정온도영역 : 293~1273K 실험방법 : laser flash method |
재현성 |
시료가공방법 : hot-pressing 시료제조법 : 34MPa, 2073K, 2h 실험절차 : sintered at 773K in vaccum 시험조건 : fair |
측정불확도 |
<5%(B형평가에 의함) |
Si3N4-thermal diffusivity[09-03-00017] 참고문헌
- NanoStructured Materials, Vol.5, Nos.7/8 p809-818(1995)
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Si3N4-thermal diffusivity[09-03-00017] 참조표준
※ monolithic Si3N4
T(K) |
monolithic Si3N4 |
300.75 |
1.669 |
472.50 |
1.270 |
674.00 |
0.982 |
|
T(K) |
monolithic Si3N4 |
872.60 |
0.839 |
1074.09 |
0.726 |
1275.58 |
0.655 |
|
※ Si3N4/10vol% SiC
T(K) |
Si3N4/10vol% SiC |
297.34 |
0.839 |
474.73 |
0.679 |
|
T(K) |
Si3N4/10vol% SiC |
672.86 |
0.519 |
873.87 |
0.431 |
1074.87 |
0.375 |
1275.88 |
0.343 |
|
※ Si3N4/34vol% SiC
T(K) |
Si3N4/34vol% SiC |
300.75 |
1.006 |
472.50 |
0.814 |
|
T(K) |
Si3N4/34vol% SiC |
671.11 |
0.623 |
872.60 |
0.543 |
1074.09 |
0.471 |
1272.41 |
0.415 |
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