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Si3N4-thermal diffusivity[09-03-00017]

Si3N4-thermal diffusivity[09-03-00017]

참조표준명 Si3N4-thermal diffusivity[09-03-00017]
참조표준 번호 KSRD.03.2009.003.001.020
DOI 10.20925/KSRD.03.2009.003.001.020
참조표준 등급 유효 참조표준
재료규격 시료형상 : d:10mm, t:2.5mm
구조 :
밀도 : 3.25~3.29 g/cm2
성분분석 : Si,N
불순물 : 0.99
측정방법 측정온도영역 : 293~1273K
실험방법 : laser flash method
재현성 시료가공방법 : hot-pressing
시료제조법 : 34MPa, 2073K, 2h
실험절차 : sintered at 773K in vaccum
시험조건 : fair
측정불확도 <5%(B형평가에 의함)

Si3N4-thermal diffusivity[09-03-00017] 참고문헌

  1. NanoStructured Materials, Vol.5, Nos.7/8 p809-818(1995)

Si3N4-thermal diffusivity[09-03-00017] 참조표준

※ monolithic Si3N4
T(K) monolithic Si3N4
300.75 1.669
472.50 1.270
674.00 0.982
T(K) monolithic Si3N4
872.60 0.839
1074.09 0.726
1275.58 0.655
※ Si3N4/10vol% SiC
T(K) Si3N4/10vol% SiC
297.34 0.839
474.73 0.679
T(K) Si3N4/10vol% SiC
672.86 0.519
873.87 0.431
1074.87 0.375
1275.88 0.343
※ Si3N4/34vol% SiC
T(K) Si3N4/34vol% SiC
300.75 1.006
472.50 0.814
T(K) Si3N4/34vol% SiC
671.11 0.623
872.60 0.543
1074.09 0.471
1272.41 0.415
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