Si3N4-thermal diffusivity[09-03-00017]
| 참조표준명 |
Si3N4-thermal diffusivity[09-03-00017] |
| 참조표준 번호 |
KSRD.03.2009.003.001.020 |
| DOI |
10.20925/KSRD.03.2009.003.001.020 |
| 참조표준 등급 |
유효 참조표준 |
| 재료규격 |
시료형상 : d:10mm, t:2.5mm
구조 :
밀도 : 3.25~3.29 g/cm2
성분분석 : Si,N
불순물 : 0.99 |
| 측정방법 |
측정온도영역 : 293~1273K
실험방법 : laser flash method |
| 재현성 |
시료가공방법 : hot-pressing
시료제조법 : 34MPa, 2073K, 2h
실험절차 : sintered at 773K in vaccum
시험조건 : fair |
| 측정불확도 |
<5%(B형평가에 의함) |
Si3N4-thermal diffusivity[09-03-00017] 참고문헌
- NanoStructured Materials, Vol.5, Nos.7/8 p809-818(1995)
|
Si3N4-thermal diffusivity[09-03-00017] 참조표준
※ monolithic Si3N4
| T(K) |
monolithic Si3N4 |
| 300.75 |
1.669 |
| 472.50 |
1.270 |
| 674.00 |
0.982 |
|
| T(K) |
monolithic Si3N4 |
| 872.60 |
0.839 |
| 1074.09 |
0.726 |
| 1275.58 |
0.655 |
|
※ Si3N4/10vol% SiC
| T(K) |
Si3N4/10vol% SiC |
| 297.34 |
0.839 |
| 474.73 |
0.679 |
|
| T(K) |
Si3N4/10vol% SiC |
| 672.86 |
0.519 |
| 873.87 |
0.431 |
| 1074.87 |
0.375 |
| 1275.88 |
0.343 |
|
※ Si3N4/34vol% SiC
| T(K) |
Si3N4/34vol% SiC |
| 300.75 |
1.006 |
| 472.50 |
0.814 |
|
| T(K) |
Si3N4/34vol% SiC |
| 671.11 |
0.623 |
| 872.60 |
0.543 |
| 1074.09 |
0.471 |
| 1272.41 |
0.415 |
|
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